Invention Application
- Patent Title: Method of Optimizing a Model, a Method of Measuring a Property, A Device Manufacturing Method, a Spectrometer and a Lithographic Apparatus
- Patent Title (中): 优化模型的方法，测量属性的方法，装置制造方法，光谱仪和平版印刷装置
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Application No.: US12247371Application Date: 2008-10-08
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Publication No.: US20090094005A1Publication Date: 2009-04-09
- Inventor: Arie Jeffrey DEN BOEF , Hugo Augustinus Joseph Cramer , Jouke Krist , Willem Jan Grootjans
- Applicant: Arie Jeffrey DEN BOEF , Hugo Augustinus Joseph Cramer , Jouke Krist , Willem Jan Grootjans
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B. V.
- Current Assignee: ASML Netherlands B. V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G06F17/10
- IPC: G06F17/10
Abstract:
A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.
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