Invention Application
US20090095320A1 Composition for Removing Photresist Layer and Method for Using it
审中-公开
去除光阻层的组成及其使用方法
- Patent Title: Composition for Removing Photresist Layer and Method for Using it
- Patent Title (中): 去除光阻层的组成及其使用方法
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Application No.: US11920248Application Date: 2006-05-12
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Publication No.: US20090095320A1Publication Date: 2009-04-16
- Inventor: Shumin Wang , Chris Chang Yu
- Applicant: Shumin Wang , Chris Chang Yu
- Applicant Address: CN Shanghai
- Assignee: ANJI MICROELECTRONICS (SHANGHAI) CO., LTD.
- Current Assignee: ANJI MICROELECTRONICS (SHANGHAI) CO., LTD.
- Current Assignee Address: CN Shanghai
- Priority: CN200510025822.6 20050513
- International Application: PCT/CN2006/000955 WO 20060512
- Main IPC: B08B3/08
- IPC: B08B3/08 ; G03F7/42 ; B08B3/12 ; B08B1/04
Abstract:
A new composition for removing a photoresist layer and a method for using the same are disclosed. The composition comprises a polar solvent and an oxidant. The composition according to the present invention comprises chemical substances with less toxicity and flammability at lower contents, which makes it more friendly to environment and decreases the expense for disposing the chemical waste. The method for using the composition shortens the time for cleaning and removes the residue more completely, thereby enhancing the electrical conductivity.
Information query
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