发明申请
- 专利标题: LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
- 专利标题(中): 图像投影目标和校正其图像缺陷的方法
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申请号: US12265090申请日: 2008-11-05
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公开(公告)号: US20090103184A1公开(公告)日: 2009-04-23
- 发明人: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
- 申请人: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
- 申请人地址: DE Oberkochen
- 专利权人: CARL ZEISS SMT AG
- 当前专利权人: CARL ZEISS SMT AG
- 当前专利权人地址: DE Oberkochen
- 主分类号: G02B3/00
- IPC分类号: G02B3/00
摘要:
Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
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