发明申请
- 专利标题: Pipetter cleaning device and cleaning method
- 专利标题(中): 移液器清洁装置和清洁方法
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申请号: US11918797申请日: 2006-04-21
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公开(公告)号: US20090114250A1公开(公告)日: 2009-05-07
- 发明人: Masayoshi Hayashi , Kazuhito Tanimoto , Keiki Sasaki
- 申请人: Masayoshi Hayashi , Kazuhito Tanimoto , Keiki Sasaki
- 申请人地址: JP Osaka-shi
- 专利权人: Wako Pure Chemical Industries, Ltd.
- 当前专利权人: Wako Pure Chemical Industries, Ltd.
- 当前专利权人地址: JP Osaka-shi
- 优先权: JP2005-123179 20050421
- 国际申请: PCT/JP2006/308390 WO 20060421
- 主分类号: B08B3/00
- IPC分类号: B08B3/00 ; B08B9/00
摘要:
Provided are a simple and inexpensive cleaning apparatus and a method for cleaning capable of effectively cleaning the outer wall surface of a pipette. A pipette to be cleaned is positioned in a concave portion of the cleaning apparatus, and a cleaning liquid passed through inside of the pipette strikes an inner circumferential surface of the concave portion and bounces therefrom to splash against the outer wall surface of the pipette, thereby cleaning the outer surface. With above arrangement, without using an ejection apparatus of cleaning water, effect equivalent to that with the ejection apparatus can be attained. Furthermore, both the inner wall surface and the outer wall surface of the pipette can be cleaned by a single operation using the same cleaning water, thereby attaining easy internal cleaning work and short cleaning time.
公开/授权文献
- US08021495B2 Pipette cleaning device and cleaning method 公开/授权日:2011-09-20