发明申请
- 专利标题: Multibit electro-mechanical memory device and manufacturing method thereof
- 专利标题(中): 多位机电记忆体装置及其制造方法
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申请号: US12289851申请日: 2008-11-06
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公开(公告)号: US20090115009A1公开(公告)日: 2009-05-07
- 发明人: Ji-Myoung Lee , Min-Sang Kim , Sung-Min Kim , Keun-Hwl Cho
- 申请人: Ji-Myoung Lee , Min-Sang Kim , Sung-Min Kim , Keun-Hwl Cho
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2007-0112660 20071106
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L21/00
摘要:
Provided are a multibit electro-mechanical memory device and a method of manufacturing the same. The device may include at least one bit line in a first direction on a substrate; at least one gate line and at least one lower word line in parallel by a given interval and in a second direction intersecting the first direction on the at least one bit line; at least one contact pad adjacent to the at least one gate line on the at least one bit line; and at least one cantilever electrode coupled to the at least one contact pad, configured to float with a void above and beneath the at least one cantilever electrode and configured to curve in a third direction vertical to the first and second directions.
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