Invention Application
- Patent Title: Vacuum Film Forming Apparatus and Vacuum Film Forming Method
- Patent Title (中): 真空成膜装置和真空膜成型方法
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Application No.: US11991841Application Date: 2006-09-11
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Publication No.: US20090134543A1Publication Date: 2009-05-28
- Inventor: Takao Umezawa , Atsuo Kitazume , Hiroshi Takano , Fusami Oyama
- Applicant: Takao Umezawa , Atsuo Kitazume , Hiroshi Takano , Fusami Oyama
- Applicant Address: JP Ota-shi ,Gunma
- Assignee: OSHIMA ELECTRIC WORKS CO., LTD.
- Current Assignee: OSHIMA ELECTRIC WORKS CO., LTD.
- Current Assignee Address: JP Ota-shi ,Gunma
- Priority: JP2005-270222 20050916
- International Application: PCT/JP2006/317954 WO 20060911
- Main IPC: B29C39/00
- IPC: B29C39/00

Abstract:
A vacuum film forming apparatus includes a target chamber in which a target is disposed for performing a vacuum film forming; a first mold at a side of the target chamber; and a second mold that includes a workpiece chamber in which a workpiece is capable of being disposed. The first mold and the second mold are structured such that a film being formed onto the workpiece is capable of being carried out by die matching between the first mold and the second mold, and a shutter device for opening and closing the target chamber is provided to the first mold.
Information query