Invention Application
US20090135510A1 REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD
审中-公开
反射投影光学系统,曝光装置,装置制造方法,投影方法和曝光方法
- Patent Title: REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD
- Patent Title (中): 反射投影光学系统,曝光装置,装置制造方法,投影方法和曝光方法
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Application No.: US12323274Application Date: 2008-11-25
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Publication No.: US20090135510A1Publication Date: 2009-05-28
- Inventor: Takuro Ono , Hiroshi Chiba , Hideki Komatsuda
- Applicant: Takuro Ono , Hiroshi Chiba , Hideki Komatsuda
- Priority: JPP2007-305066 20071126
- Main IPC: G02B17/06
- IPC: G02B17/06

Abstract:
A reflective projection optical system comprises a first optical unit having at least one reflecting optical element, and a second optical unit having at least one reflecting optical element. A focal point on the second surface side of the first optical unit approximately agrees with a focal point on the first surface side of the second optical unit. An angle between a normal to the first surface and a principal ray of the illumination beam incident to the first surface is larger than a value of arcsine of a numerical aperture on the first surface side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam incident to the first surface.
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