发明申请
US20090135510A1 REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD
审中-公开
反射投影光学系统,曝光装置,装置制造方法,投影方法和曝光方法
- 专利标题: REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD
- 专利标题(中): 反射投影光学系统,曝光装置,装置制造方法,投影方法和曝光方法
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申请号: US12323274申请日: 2008-11-25
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公开(公告)号: US20090135510A1公开(公告)日: 2009-05-28
- 发明人: Takuro Ono , Hiroshi Chiba , Hideki Komatsuda
- 申请人: Takuro Ono , Hiroshi Chiba , Hideki Komatsuda
- 优先权: JPP2007-305066 20071126
- 主分类号: G02B17/06
- IPC分类号: G02B17/06
摘要:
A reflective projection optical system comprises a first optical unit having at least one reflecting optical element, and a second optical unit having at least one reflecting optical element. A focal point on the second surface side of the first optical unit approximately agrees with a focal point on the first surface side of the second optical unit. An angle between a normal to the first surface and a principal ray of the illumination beam incident to the first surface is larger than a value of arcsine of a numerical aperture on the first surface side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam incident to the first surface.
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