发明申请
US20090135711A1 INFORMATION READOUT METHOD FOR NON MASK LAYER TYPE OPTICAL INFORMATION MEDIUM
有权
用于非掩蔽层类型光信息介质的信息读出方法
- 专利标题: INFORMATION READOUT METHOD FOR NON MASK LAYER TYPE OPTICAL INFORMATION MEDIUM
- 专利标题(中): 用于非掩蔽层类型光信息介质的信息读出方法
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申请号: US12352304申请日: 2009-01-12
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公开(公告)号: US20090135711A1公开(公告)日: 2009-05-28
- 发明人: Takashi KIKUKAWA , Tatsuya Kato , Hajime Utsunomiya , Hiroshi Shingai
- 申请人: Takashi KIKUKAWA , Tatsuya Kato , Hajime Utsunomiya , Hiroshi Shingai
- 申请人地址: JP Tokyo
- 专利权人: TDK CORPORATION
- 当前专利权人: TDK CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2001-123521 20010420; JP2002-093026 20020328
- 主分类号: G11B7/00
- IPC分类号: G11B7/00
摘要:
An information readout method for an optical information medium comprising an information recording layer having pits or recorded marks representative of information data involves the step of irradiating a laser beam to the information recording layer through an objective lens for providing readings of the pits or recorded marks. When the laser beam has a wavelength λ of 400 to 410 nm, the objective lens has a numerical aperture NA of 0.70 to 0.85, and the pits or recorded marks have a minimum size PL of up to 0.36λ/NA, readout is carried out at a power Pr of at least 0.4 mW for the laser beam. When the laser beam has a wavelength λ of 630 to 670 nm, the objective lens has a numerical aperture NA of 0.60 to 0.65, and the pits or recorded marks have a minimum size PL of up to 0.36λ/NA, readout is carried out at a power Pr of at least 1.0 mW for the laser beam. Pits or recorded marks of a size approximate to the resolution limit determined by diffraction can be read out at a high C/N.
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