发明申请
- 专利标题: SEMICONDUCTOR DEVICE
- 专利标题(中): 半导体器件
-
申请号: US12271102申请日: 2008-11-14
-
公开(公告)号: US20090152622A1公开(公告)日: 2009-06-18
- 发明人: Hiroshi Itokawa , Ichiro Mizushima
- 申请人: Hiroshi Itokawa , Ichiro Mizushima
- 优先权: JP2007-297022 20071115
- 主分类号: H01L29/94
- IPC分类号: H01L29/94
摘要:
A semiconductor device includes a first semiconductor region having a channel region, and containing silicon as a main component, second semiconductor regions sandwiching the first semiconductor region, formed of SiGe, and applying stress to the first semiconductor region, cap layers provided on the second semiconductor regions, and formed of silicon containing carbon or SiGe containing carbon, and silicide layers provided on the cap layers, and formed of nickel silicide or nickel-platinum alloy silicide.
公开/授权文献
- US07986013B2 Semiconductor device having SiGe semiconductor regions 公开/授权日:2011-07-26
信息查询
IPC分类: