Invention Application
- Patent Title: ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME
- Patent Title (中): 亚胺衍生物及其生产方法
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Application No.: US12363895Application Date: 2009-02-02
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Publication No.: US20090156854A1Publication Date: 2009-06-18
- Inventor: Naoyoshi HATAKEYAMA , Shinji Tanaka , Hidetoshi Ono , Yasunari Okada
- Applicant: Naoyoshi HATAKEYAMA , Shinji Tanaka , Hidetoshi Ono , Yasunari Okada
- Applicant Address: JP Chiyoda-ku
- Assignee: Idemitsu Kosan Co., Ltd.
- Current Assignee: Idemitsu Kosan Co., Ltd.
- Current Assignee Address: JP Chiyoda-ku
- Priority: JP2004-029034 20040205; JP2004-066626 20040310; JP2004-218686 20040727; JP2004-296542 20041008
- Main IPC: C07C255/01
- IPC: C07C255/01 ; C07C69/533

Abstract:
The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl (meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.
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