发明申请
US20090166680A1 Unity beta ratio tri-gate transistor static radom access memory (SRAM) 有权
Unity beta比例三栅晶体管静态天线存取存储器(SRAM)

Unity beta ratio tri-gate transistor static radom access memory (SRAM)
摘要:
In general, in one aspect, a method includes forming N-diffusion and P-diffusion fins in a semiconductor substrate. A P-diffusion gate layer is formed over the semiconductor substrate and removed from the N-diffusion fins. A pass-gate N-diffusion gate layer is formed over the semiconductor substrate and removed from the P-diffusion fins and pull-down N-diffusion fins. A pull-down N-diffusion layer is formed over the semiconductor substrate.
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