Invention Application
- Patent Title: METHOD FOR GAS PHASE OXIDATION USING A MODERATOR LAYER
- Patent Title (中): 使用调节器层进行气相氧化的方法
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Application No.: US12298453Application Date: 2007-04-27
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Publication No.: US20090171101A1Publication Date: 2009-07-02
- Inventor: Thomas Lautensack , Hans-Martin Allmann , Hagen Wilmer
- Applicant: Thomas Lautensack , Hans-Martin Allmann , Hagen Wilmer
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Priority: EP06008816.8 20060427
- International Application: PCT/EP07/54150 WO 20070427
- Main IPC: C07D307/89
- IPC: C07D307/89

Abstract:
A process for gas phase oxidation in which a gaseous stream which comprises at least one aromatic hydrocarbon and molecular oxygen is passed through one or more catalyst layers, wherein a moderator layer is arranged between two catalyst layers arranged in succession in flow direction of the gaseous stream, the moderator layer being less catalytically active than the catalysts adjacent upstream and downstream or being catalytically inactive. The desired oxidation products are obtained in high yield over prolonged periods.
Public/Granted literature
- US08067618B2 Method for gas phase oxidation using a moderator layer Public/Granted day:2011-11-29
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