发明申请
US20090180508A1 TWO-WAVELENGTH SEMICONDUCTOR LASER DEVICE AND ITS FABRICATING METHOD 有权
双波长半导体激光器件及其制造方法

  • 专利标题: TWO-WAVELENGTH SEMICONDUCTOR LASER DEVICE AND ITS FABRICATING METHOD
  • 专利标题(中): 双波长半导体激光器件及其制造方法
  • 申请号: US12269583
    申请日: 2008-11-12
  • 公开(公告)号: US20090180508A1
    公开(公告)日: 2009-07-16
  • 发明人: Kouji MAKITATakayuki Kashima
  • 申请人: Kouji MAKITATakayuki Kashima
  • 优先权: JP2008-004278 20080111
  • 主分类号: H01S5/00
  • IPC分类号: H01S5/00 H01L21/00
TWO-WAVELENGTH SEMICONDUCTOR LASER DEVICE AND ITS FABRICATING METHOD
摘要:
A two-wavelength semiconductor laser device includes a first semiconductor laser device including a first-conductivity type first cladding layer, a first guide layer made of AlGaAs mixed crystal, a first quantum well active layer having a barrier layer made of AlGaAs mixed crystal, a second guide layer made of AlGaAs mixed crystal, and a second-conductivity type second cladding layer, and a second semiconductor laser device including a first-conductivity type third cladding layer, a third guide layer made of AlGaInP mixed crystal, a second quantum well active layer having a barrier layer made of AlGaInP mixed crystal, a fourth guide layer made of AlGaInP mixed crystal, and a second-conductivity type fourth cladding layer. At least the barrier layer included in the first quantum well active layer, the first guide layer, and the second guide layer each have an Al molar ratio of more than 0.47 and 0.60 or less.
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