发明申请
- 专利标题： 2-Cyanophenylboronic Acid or Ester Thereof in Which Impurities Are Decreased, and Production Method Thereof
- 专利标题（中）： 其中杂质减少的2-氰基苯基硼酸或其酯及其制备方法
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申请号： US12226747申请日： 2007-04-11
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公开(公告)号： US20090184289A1公开(公告)日： 2009-07-23
- 发明人: Shinichiro Nakamura
- 申请人： Shinichiro Nakamura
- 优先权： JP2006-124947 20060428
- 国际申请： PCT/JP2007/057945 WO 20070411
- 主分类号： C07F5/02
- IPC分类号： C07F5/02 ; C09K3/00
摘要：
A method for producing high-purity 2-cyanophenylboronic acid, characterized by reacting benzonitrile, lithium 2,2,6,6-tetramethylpiperidide, and trialkoxyborane, adding an aqueous acidic solution to a reaction solution containing the obtained 2-cyanophenylboronic acid, carrying out a contact treatment at a pH of below 7 in the presence of a water-immiscible organic solvent, and then obtaining the 2-cyanophenylboronic acid from the organic layer.