发明申请
- 专利标题: Resistive memory devices and methods of manufacturing the same
- 专利标题(中): 电阻式存储器件及其制造方法
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申请号: US12230223申请日: 2008-08-26
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公开(公告)号: US20090184305A1公开(公告)日: 2009-07-23
- 发明人: Chang-bum Lee , Young-soo Park , Myung-jae Lee , Xianyu Wenxu , Bo-soo Kang , Seung-eon Ahn , Ki-hwan Kim
- 申请人: Chang-bum Lee , Young-soo Park , Myung-jae Lee , Xianyu Wenxu , Bo-soo Kang , Seung-eon Ahn , Ki-hwan Kim
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2008-007082 20080123
- 主分类号: H01L47/00
- IPC分类号: H01L47/00 ; H01L21/00
摘要:
A resistive memory device includes a first electrode and a first insulation layer arranged on the first electrode. A portion of the first electrode is exposed through a first hole in the first insulation layer. A first variable resistance layer contacts the exposed portion of the first electrode and extends on the first insulation layer around the first hole. A first switching device electrically connects to the first resistive switching layer.