发明申请
US20090185184A1 ALIGNMENT APPARATUS FOR MANUFACTURING A LIQUID JET HEAD, AN ALIGNMENT METHOD FOR MANUFACTURING THE SAME AND METHOD OF MANUFACTURING A LIQUID JET HEAD UNIT
审中-公开
用于制造液体喷射头的对准装置，用于制造其的对准方法和制造液体喷射头单元的方法
- 专利标题： ALIGNMENT APPARATUS FOR MANUFACTURING A LIQUID JET HEAD, AN ALIGNMENT METHOD FOR MANUFACTURING THE SAME AND METHOD OF MANUFACTURING A LIQUID JET HEAD UNIT
- 专利标题（中）： 用于制造液体喷射头的对准装置，用于制造其的对准方法和制造液体喷射头单元的方法
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申请号： US12355635申请日： 2009-01-16
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公开(公告)号： US20090185184A1公开(公告)日： 2009-07-23
- 发明人: Yasuo Inaoka , Takuma Okamuro
- 申请人： Yasuo Inaoka , Takuma Okamuro
- 申请人地址： JP Shinjuku-ku
- 专利权人： SEIKO EPSON CORPORATION
- 当前专利权人： SEIKO EPSON CORPORATION
- 当前专利权人地址： JP Shinjuku-ku
- 优先权： JP2008-008516 20080117
- 主分类号： G01B11/00
- IPC分类号： G01B11/00
摘要：
An alignment apparatus includes a mask 410 which has a reference mark 401 at which an alignment mark 22 of an ink jet recording head 220 is positioned and a bifocal microscope 500 which has a first optical system 501 having an optical axis L1 and a second optical system 502 having an optical axis L2 and in which the first optical system 501 can focus on the reference mark 401 and the second optical system 502 can focus on the alignment mark 22. The bifocal microscope 500 is provided with optical axis adjustment means 520 which adjusts a direction of a reflection face of a second mirror 509 so that the optical axes L1 and L2 coincident with each other are incident to the reference mark 401 and the alignment mark 22.
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