Invention Application
- Patent Title: REACTOR-INTEGRATED SYPHON
- Patent Title (中): 反应器集成SIPHON
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Application No.: US12064572Application Date: 2006-03-23
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Publication No.: US20090191104A1Publication Date: 2009-07-30
- Inventor: Takahiro Murakami , Koubun Kyo , Toshiyuki Suda
- Applicant: Takahiro Murakami , Koubun Kyo , Toshiyuki Suda
- Applicant Address: JP Koto-ku
- Assignee: IHI CORPORATION
- Current Assignee: IHI CORPORATION
- Current Assignee Address: JP Koto-ku
- Priority: JP2005-246251 20050826
- International Application: PCT/JP2006/305786 WO 20060323
- Main IPC: B01J8/08
- IPC: B01J8/08

Abstract:
In order to improve sealing properties between a downcomer 10 and a high-speed layer 20 and in order to efficiently take out produced gas obtained through gasification of, for example, a solid reactant, a syphon 30 for sealing between a downcomer 10 and a high-speed layer 20 through temporary storage of particles moving from the downcomer 10 to the high-speed layer 20 comprises a reactor portion 70 for causing the solid reactant to conduct chemical reaction through action of the particles, a downcomer seal portion 40 in communication, at upper and lower ends thereof, with the downcomer 10 and a lower portion the reactor portion 70, respectively, a particle outlet seal portion 50 provided in a spaced apart relationship from the downcomer seal portion 40 and in communication, at upper and lower ends thereof, with the high-speed layer 20 and the lower portion of the reactor portion 70, respectively, and a freeboard portion 76 formed above the reactor portion 70.
Public/Granted literature
- US07875249B2 Reactor-integrated syphon Public/Granted day:2011-01-25
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