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发明申请
US20090191471A1 Composition for cleaning a phase shift mask and associated methods 审中-公开
用于清洗相移掩模和相关方法的组合物

Composition for cleaning a phase shift mask and associated methods
摘要：
A composition for cleaning a phase shift mask, including an organic acid ammonium salt, wherein a base ionization constant (Kb) of organic acid ions is larger than an acid ionization constant (Ka) of ammonium ions, hydrogen peroxide, and water, and associated methods.
摘要（中）：

一种用于清洗包含有机酸铵盐的相移掩模的组合物，其中有机酸离子的碱电离常数（Kb）大于铵离子，过氧化氢和水的酸离子常数（Ka） 方法。

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