发明申请
- 专利标题: Resistive Memory Element and Method of Fabrication
- 专利标题(中): 电阻记忆元件及其制作方法
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申请号: US12028513申请日: 2008-02-08
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公开(公告)号: US20090200533A1公开(公告)日: 2009-08-13
- 发明人: Klaus-Dieter Ufert , Josef Willer
- 申请人: Klaus-Dieter Ufert , Josef Willer
- 主分类号: H01L47/00
- IPC分类号: H01L47/00 ; H01L21/00
摘要:
An integrated circuit including a memory cell and a method of manufacturing the integrated circuit are described. The memory cell includes a buried gate select transistor and a resistive memory element coupled to the buried gate select transistor. The resistive memory element stores information based on a resistivity of the resistive memory element.
公开/授权文献
- US07741630B2 Resistive memory element and method of fabrication 公开/授权日:2010-06-22
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