发明申请
- 专利标题： POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- 专利标题（中）： 积极的组合和绘图过程
-
申请号： US12370652申请日： 2009-02-13
-
公开(公告)号： US20090202943A1公开(公告)日： 2009-08-13
- 发明人: Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
- 申请人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
- 优先权： JP2008-031322 20080213
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; C08F228/02 ; C08F24/00
摘要：
A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
公开/授权文献
- US08062828B2 Positive resist composition and patterning process 公开/授权日：2011-11-22