发明申请
US20090207393A1 Damping Arrangement, Active Damping System, Lithographic Apparatus, And Projection Assembly
失效
阻尼布置,主动阻尼系统,平版印刷设备和投影组件
- 专利标题: Damping Arrangement, Active Damping System, Lithographic Apparatus, And Projection Assembly
- 专利标题(中): 阻尼布置,主动阻尼系统,平版印刷设备和投影组件
-
申请号: US12268622申请日: 2008-11-11
-
公开(公告)号: US20090207393A1公开(公告)日: 2009-08-20
- 发明人: Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
- 申请人: Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.
公开/授权文献
信息查询