发明申请
US20090207398A1 Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member
审中-公开
近场暴露减少了表面等离子体极化波在光阻挡件周围的散射
- 专利标题： Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member
- 专利标题（中）： 近场暴露减少了表面等离子体极化波在光阻挡件周围的散射
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申请号： US12434992申请日： 2009-05-04
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公开(公告)号： US20090207398A1公开(公告)日： 2009-08-20
- 发明人: Ryo Kuroda , Natsuhiko Mizutani , Tomohiro Yamada
- 申请人： Ryo Kuroda , Natsuhiko Mizutani , Tomohiro Yamada
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2003-179587 20030624; JP2004-097983 20040330
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03F1/00 ; G03B27/32
摘要：
An exposure mask in which exposure of an exposure object is carried out on the basis of near field light leaking from a plurality of openings provided in a light blocking member in a mutually adjoining relation, in which the spacing between adjacent openings is not greater than the wavelength of light used for the exposure, and an end portion of the opening at the exposure object side has a structure effective to reduce scatter of a surface plasmon polariton wave going around to the exposure object side of the light blocking member.
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