发明申请
US20090208867A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process
有权
抗蚀剂组合物，抗蚀保护涂料组合物和图案化方法
- 专利标题： Resist Composition, Resist Protective Coating Composition, and Patterning Process
- 专利标题（中）： 抗蚀剂组合物，抗蚀保护涂料组合物和图案化方法
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申请号： US12371347申请日： 2009-02-13
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公开(公告)号： US20090208867A1公开(公告)日： 2009-08-20
- 发明人: Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
- 申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
- 优先权： JP2008-032896 20080214
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/004
摘要：
A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist composition and protective coating composition exhibit good water repellency and water slip and produce few development defects.
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