发明申请
- 专利标题: SILANE POLYMER AND METHOD FOR FORMING SILICON FILM
- 专利标题(中): 硅烷聚合物和形成硅膜的方法
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申请号: US12398451申请日: 2009-03-05
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公开(公告)号: US20090215920A1公开(公告)日: 2009-08-27
- 发明人: Haruo Iwasawa , Daohai Wang , Yasuo Matsuki , Hitoshi Kato
- 申请人: Haruo Iwasawa , Daohai Wang , Yasuo Matsuki , Hitoshi Kato
- 申请人地址: JP Chuo-Ku
- 专利权人: JSR CORPORATION
- 当前专利权人: JSR CORPORATION
- 当前专利权人地址: JP Chuo-Ku
- 优先权: JP2003-169769 20030613
- 主分类号: C08F2/46
- IPC分类号: C08F2/46 ; B05D3/02 ; B05D3/06
摘要:
There are provided a silane polymer having a higher molecular weight from the viewpoints of wettability when applied to a substrate, a boiling point and safety, a composition which can form a high-quality silicon film easily, a silicon film forming composition which comprises a silane polymer obtained by irradiating a photopolymerizable silane compound with light of specific wavelength range to photopolymerize it, and a method for forming a silicon film which comprises applying the composition to a substrate and subjecting the coating film to a heat treatment and/or a light treatment.
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