发明申请
US20090217223A1 Layout design method of semiconductor integrated circuit 有权
半导体集成电路布图设计方法

  • 专利标题: Layout design method of semiconductor integrated circuit
  • 专利标题(中): 半导体集成电路布图设计方法
  • 申请号: US12320325
    申请日: 2009-01-23
  • 公开(公告)号: US20090217223A1
    公开(公告)日: 2009-08-27
  • 发明人: Masahiro Kojima
  • 申请人: Masahiro Kojima
  • 申请人地址: JP Kawasaki
  • 专利权人: NEC Electronics Corporation
  • 当前专利权人: NEC Electronics Corporation
  • 当前专利权人地址: JP Kawasaki
  • 优先权: JP2008-044501 20080226
  • 主分类号: G06F17/50
  • IPC分类号: G06F17/50
Layout design method of semiconductor integrated circuit
摘要:
A layout design method of a semiconductor integrated circuit includes degenerating a layout netlist extracted from layout data, comparing the layout netlist after the reduction with a circuit diagram netlist, and creating a layout circuit association table of a layout cell after the reduction and a circuit element. The method includes creating a before and after reduction association table based on the layout netlist before and after the reduction, counting the number of layout elements in a layout cell area before the reduction, comparing the counted number of layout elements and the number of degenerated elements, and creating mapping information associating the layout cell with the circuit element.
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