发明申请
- 专利标题: ANISOTROPIC SILICON ETCHANT COMPOSITION
- 专利标题(中): 各向异性硅蚀刻剂组合物
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申请号: US12393090申请日: 2009-02-26
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公开(公告)号: US20090218542A1公开(公告)日: 2009-09-03
- 发明人: Kenji Isami , Mayumi Kimura , Tetsuo Aoyama , Tsuguhiro Tago
- 申请人: Kenji Isami , Mayumi Kimura , Tetsuo Aoyama , Tsuguhiro Tago
- 申请人地址: JP Osaka JP Osaka JP Gunma JP Niigata
- 专利权人: Hayashi Pure Chemical Ind, Ltd.,SANYO ELECTRIC CO., LTD.,Sanyo Semiconductor Co., Ltd.,SANYO Semiconductor Manufacturing Co., Ltd
- 当前专利权人: Hayashi Pure Chemical Ind, Ltd.,SANYO ELECTRIC CO., LTD.,Sanyo Semiconductor Co., Ltd.,SANYO Semiconductor Manufacturing Co., Ltd
- 当前专利权人地址: JP Osaka JP Osaka JP Gunma JP Niigata
- 优先权: JP2008-047979 20080228
- 主分类号: C09K13/02
- IPC分类号: C09K13/02 ; C09K13/00
摘要:
An etchant composition contains (a) an alkaline compound mixture of an organic alkaline compound and inorganic alkaline compound and (b) a silicon-containing compound. The organic alkaline compound is composed of one or more ingredients from quaternary ammonium hydroxide and ethylenediamine. The inorganic alkaline compound is composed of one or more ingredients from sodium hydroxide, potassium hydroxide, ammonia and hydrazine. The silicon-containing inorganic compound is composed of one or more ingredients from metal silicon, fumed silica, colloidal silica, silica gel, silica sol, diatomaceous earth, acid clay and activated clay, and the silicon-containing organic compound is composed of one or more ingredients from quaternary ammonium salts of alkyl silicate and quaternary ammonium salts of alkyl silicic acid.
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