Invention Application
US20090222109A1 POSITION CONTROL APPARATUS INCLUDING ITERATIVE LEARNING CIRCUIT, EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND ITERATIVE LEARNING METHOD FOR USE IN POSITION CONTROL APPARATUS HAVING ITERATIVE LEARNING CIRCUIT INCLUDING LEARNING FILTER
有权
位置控制装置，包括迭代学习电路，曝光装置，制造装置的方法以及用于具有包括学习过滤器的迭代学习电路的位置控制装置的迭代学习方法
- Patent Title: POSITION CONTROL APPARATUS INCLUDING ITERATIVE LEARNING CIRCUIT, EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND ITERATIVE LEARNING METHOD FOR USE IN POSITION CONTROL APPARATUS HAVING ITERATIVE LEARNING CIRCUIT INCLUDING LEARNING FILTER
- Patent Title (中): 位置控制装置，包括迭代学习电路，曝光装置，制造装置的方法以及用于具有包括学习过滤器的迭代学习电路的位置控制装置的迭代学习方法
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Application No.: US12393871Application Date: 2009-02-26
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Publication No.: US20090222109A1Publication Date: 2009-09-03
- Inventor: Kiyoshi Takagi
- Applicant: Kiyoshi Takagi
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Priority: JP2008-050126 20080229
- Main IPC: G05D1/12
- IPC: G05D1/12 ; G05B13/02 ; G06F17/00
Abstract:
A position control apparatus includes a detecting unit configured to detect a position of a control target, a subtracting unit configured to subtract an output of the detecting unit from a target value, an iterative learning control circuit including a filter into which a deviation between the output of the detecting unit and the target value is input, where the iterative learning control circuit feeds forward a control input to the control target, and a parameter computing unit configured to compute a variation in a parameter of the control target. A characteristic of the filter is computed in accordance with the variation in the parameter of the control target.
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