发明申请
- 专利标题: METHOD OF MANUFACTURING PHOTOELECTRIC DEVICE
- 专利标题(中): 制造光电器件的方法
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申请号: US12400674申请日: 2009-03-09
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公开(公告)号: US20090233399A1公开(公告)日: 2009-09-17
- 发明人: Seung-Jae Jung , Byoung-June Kim , Jin-Seock Kim , Czang-Ho Lee , Myung-Hun Shin , Joon-Young Seo , Dong-Uk Choi , Byoung-Kyu Lee
- 申请人: Seung-Jae Jung , Byoung-June Kim , Jin-Seock Kim , Czang-Ho Lee , Myung-Hun Shin , Joon-Young Seo , Dong-Uk Choi , Byoung-Kyu Lee
- 优先权: KR10-2008-23490 20080313
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
In a method of manufacturing a photoelectric device, a transparent conductive layer is formed on a substrate, and the transparent conductive layer is partially etched using an etching solution including hydrofluoric acid. Thus, a transparent electrode having a concavo-convex pattern on its surface is formed. When the transparent conductive layer is partially etched, a haze of the transparent electrode may be controlled by adjusting an etching time of the transparent conductive layer. Also, since the etching solution is sprayed to the transparent conductive layer to etch the transparent conductive layer, the concavo-convex pattern on the surface of the transparent electrode may be easily formed even though the size of the substrate increases.
公开/授权文献
- US07972883B2 Method of manufacturing photoelectric device 公开/授权日:2011-07-05
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