发明申请
US20090234348A1 Method and Structure for Ameliorating Side-Effects of Performing in Situ Fenestration Using a Plasma RF Catheter
有权
改善使用等离子体射频导管进行原位开窗的副作用的方法和结构
- 专利标题： Method and Structure for Ameliorating Side-Effects of Performing in Situ Fenestration Using a Plasma RF Catheter
- 专利标题（中）： 改善使用等离子体射频导管进行原位开窗的副作用的方法和结构
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申请号： US12049522申请日： 2008-03-17
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公开(公告)号： US20090234348A1公开(公告)日： 2009-09-17
- 发明人: Walter Bruszewski , Trevor Greenan
- 申请人： Walter Bruszewski , Trevor Greenan
- 申请人地址： US CA Santa Rosa
- 专利权人： Medtronic Vascular, Inc.
- 当前专利权人： Medtronic Vascular, Inc.
- 当前专利权人地址： US CA Santa Rosa
- 主分类号： A61B18/18
- IPC分类号： A61B18/18
摘要：
When a main stent-graft is placed in a vessel of a patient and a branch vessel is blocked by the main stent-graft, a RF plasma catheter is used to cut out a portion of the graft cloth of the main-stent graft adjacent to an ostium of the branch vessel to be perfused. To ameliorate possible adverse effects associated with the use of the RF plasma catheter, e.g., creation of coagulum, (desiccated, coagulated blood) or perhaps a cut stent strut, a special process using saline flushing, a novel RF plasma catheter with an insulated tip, or a combination of the two is used.
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