发明申请
- 专利标题: Light-Sensitive Component for Use in Photoresists
- 专利标题(中): 用于光致抗蚀剂的光敏组分
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申请号: US12084614申请日: 2006-11-06
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公开(公告)号: US20090253073A1公开(公告)日: 2009-10-08
- 发明人: Wolfgang Zahn , Ralf Grottenmüller , Dieter Wagner
- 申请人: Wolfgang Zahn , Ralf Grottenmüller , Dieter Wagner
- 优先权: DE102005052885.6 20051107
- 国际申请: PCT/EP2006/010607 WO 20061106
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; C08G8/02 ; G03F7/004
摘要:
A compound of the formula (I) where the symbols and indices are each defined as follows: A is A′, R or O—R; where R is a straight-chain, branched or cyclic, saturated or unsaturated aliphatic radical having 1-8 carbon atoms; A′ is the same or different and is B is a bond, —O—C(O)—, —C(O)—O—, —O—C(O)—, —C(O)—NH—, —NH—C(O)—, —C(O)—O—CH2—CH(OH)—CH2—O, —O—CH2—CH(OH)—CH2—O—(O)C—, —O—C(O)—O—, —O—C(O)—NH— or —NH—C(O)—O—; R1 is H or OH; m is 1, 2, 3, 4 or 5; Y is n is a positive rational number ≧3; E is the same or different and is —CH—CHR2—, —CHR2—CH2—, —CH2—CHR2—O—, —O—CHR2—CH2—, —(CH2)r—O— or —O—(CH2)—; R2 is H or CH3 and r is 1 or 4, is suitable as a light-sensitive component for photoresists.
公开/授权文献
- US08012664B2 Light-sensitive component for use in photoresists 公开/授权日:2011-09-06