Invention Application
- Patent Title: METHOD FOR MANUFACTURING PATTERNED THIN-FILM LAYER
- Patent Title (中): 制造图案薄膜层的方法
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Application No.: US12422251Application Date: 2009-04-11
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Publication No.: US20090256875A1Publication Date: 2009-10-15
- Inventor: CHING-YU CHOU , STEPHEN KO-CHIANG CHIEN , YU-NING WANG
- Applicant: CHING-YU CHOU , STEPHEN KO-CHIANG CHIEN , YU-NING WANG
- Applicant Address: US CA Santa Clara
- Assignee: ICF TECHNOLOGY LIMITED.
- Current Assignee: ICF TECHNOLOGY LIMITED.
- Current Assignee Address: US CA Santa Clara
- Priority: TW97113239 20080411
- Main IPC: B41J29/38
- IPC: B41J29/38

Abstract:
A method for manufacturing a patterned thin-film layer includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces; providing an ink-jet device comprising a plurality of nozzles for depositing ink therefrom; generating a jetting information about ink volume that each of the nozzles deposits into the respective spaces by a random method, the jetting information meeting ink volume deposited into each of the spaces is in a range from about 92.5% to about 107.5% of an average volume of ink in the spaces; making the nozzles to deposit ink into the respective spaces according to the jetting information; and solidifying the ink so as to form a plurality of patterned thin-film layers formed in the spaces.
Public/Granted literature
- US08197899B2 Method for manufacturing patterned thin-film layer Public/Granted day:2012-06-12
Information query
IPC分类: