发明申请
- 专利标题: HYDROPHOBIC NANOSTRUCTURED THIN FILMS
- 专利标题(中): 疏水性纳米薄膜
-
申请号: US12430932申请日: 2009-04-28
-
公开(公告)号: US20090269587A1公开(公告)日: 2009-10-29
- 发明人: Walter J. Dressick , Melik C. Demirel , Alok Singh
- 申请人: Walter J. Dressick , Melik C. Demirel , Alok Singh
- 申请人地址: US DC Washington
- 专利权人: The Government of the United States of America, as represented by the Secretary of the Navy
- 当前专利权人: The Government of the United States of America, as represented by the Secretary of the Navy
- 当前专利权人地址: US DC Washington
- 主分类号: B32B27/00
- IPC分类号: B32B27/00 ; C23C16/448 ; C08G61/02
摘要:
Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
公开/授权文献
- US08535805B2 Hydrophobic nanostructured thin films 公开/授权日:2013-09-17
信息查询