发明申请
- 专利标题: Semiconductor Light-Emitting Device and Process for Producing the Same
- 专利标题(中): 半导体发光器件及其制造方法
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申请号: US12223739申请日: 2007-02-08
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公开(公告)号: US20090272992A1公开(公告)日: 2009-11-05
- 发明人: Kazuaki Tsutsumi , Norikazu Ito , Masayuki Sonobe , Shinichi Tamai
- 申请人: Kazuaki Tsutsumi , Norikazu Ito , Masayuki Sonobe , Shinichi Tamai
- 申请人地址: JP Kyoto-shi
- 专利权人: Rohn Co., Ltd.
- 当前专利权人: Rohn Co., Ltd.
- 当前专利权人地址: JP Kyoto-shi
- 优先权: JP2006-030963 20060208
- 国际申请: PCT/JP2007/052220 WO 20070208
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
A semiconductor light emitting device of the present invention includes a substrate (1), an n-GaN layer (2) supported by the substrate (1), a p-GaN layer (7) which is located farther from the substrate (1) than the n-GaN layer (2) is, an active layer (4) formed between the n-GaN layer (2) and the p-GaN layer (7) and containing InGaN, a sublimation preventing layer (5) formed between the active layer (4) and the p-GaN layer (7) and containing InGaN, and an In composition gradient layer (6) sandwiched between the sublimation preventing layer (5) and the p-GaN layer (7) and having such In composition ratio gradient that the In composition ratio decreases in the thickness direction toward the p-GaN layer (7).
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