发明申请
- 专利标题: METHOD AND APPARATUS FOR PLASMA-TREATING POROUS BODY
- 专利标题(中): 用于等离子体处理多孔体的方法和装置
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申请号: US12066447申请日: 2006-09-11
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公开(公告)号: US20090277776A1公开(公告)日: 2009-11-12
- 发明人: Koichi Kono , Kotaro Kimishima , Kazuki Kiso
- 申请人: Koichi Kono , Kotaro Kimishima , Kazuki Kiso
- 申请人地址: JP Tokyo
- 专利权人: Tonen Chemcial Corporation
- 当前专利权人: Tonen Chemcial Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2005264269 20050912
- 国际申请: PCT/JP2006/318004 WO 20060911
- 主分类号: H05H1/24
- IPC分类号: H05H1/24 ; B01J19/08
摘要:
A method for plasma-treating a porous body, comprising the steps of generating plasma using an inert gas or a mixed gas of an inert gas and a reactive gas, (a) blowing the resultant plasma gas to the porous body at a flow rate per a unit area of the porous body of 0.002 to 2 L/minute/cm2, (b) sucking the porous body in a plasma gas atmosphere, or (c) sucking the porous body while blowing the plasma gas to the porous body at said flow rate, thereby treating the plasma the surfaces and pores of said porous body with plasma.
公开/授权文献
- US08475724B2 Method and apparatus for plasma-treating porous body 公开/授权日:2013-07-02