发明申请
- 专利标题： Apparatus Including Heating Source Reflective Filter for Pyrometry
- 专利标题（中）： 包括热源反射滤光片的设备
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申请号： US12483770申请日： 2009-06-12
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公开(公告)号： US20090289053A1公开(公告)日： 2009-11-26
- 发明人: Joseph M. Ranish , Aaron M. Hunter , Blake R. Koelmel , Bruce E. Adams
- 申请人： Joseph M. Ranish , Aaron M. Hunter , Blake R. Koelmel , Bruce E. Adams
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H05B1/00
- IPC分类号： H05B1/00 ; A21B2/00 ; H05B6/00 ; G21G5/00
摘要：
Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.
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