发明申请
- 专利标题： Green Photoresist and Color Filter Substrate using the same
- 专利标题（中）： 绿色光刻胶和彩色滤光片基板使用相同
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申请号： US12210222申请日： 2008-09-15
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公开(公告)号： US20090291373A1公开(公告)日： 2009-11-26
- 发明人: Chien-Kai CHEN , Ya-Ling Hsu , Chun-Liang Lin , Chen-Hsien Liao
- 申请人： Chien-Kai CHEN , Ya-Ling Hsu , Chun-Liang Lin , Chen-Hsien Liao
- 优先权： TW097119133 20080523
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F7/004
摘要：
In a green photoresist for a color filter substrate, GY×Gy is greater than 33 when the green photoresist is tested by a standard C light source and Gy is greater than or equal to 0.6. A light beam from the standard C light source after passing through the green photoresist corresponds to a y coordinate in a CIE 1931 chromaticity diagram and Gy represents the y coordinate. GY represents light transmittance of the green photoresist for the light beam from the standard C light source. The green photoresist improves the light transmittance. Further, a color filter substrate using the green photoresist is provided.
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