发明申请
US20090305427A1 APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS
有权
在半导体处理系统中感测荧光物种的装置和方法
- 专利标题: APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS
- 专利标题(中): 在半导体处理系统中感测荧光物种的装置和方法
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申请号: US12537910申请日: 2009-08-07
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公开(公告)号: US20090305427A1公开(公告)日: 2009-12-10
- 发明人: Frank Dimeo, JR. , Philip S.H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
- 申请人: Frank Dimeo, JR. , Philip S.H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
- 申请人地址: US CT Danbury
- 专利权人: ADVANCED TECHNOLOGY MATERIALS, INC.
- 当前专利权人: ADVANCED TECHNOLOGY MATERIALS, INC.
- 当前专利权人地址: US CT Danbury
- 主分类号: G01N33/00
- IPC分类号: G01N33/00 ; B01J19/00
摘要:
A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.