发明申请
- 专利标题： SEMICONDUCTOR DEVICE PRODUCTION CONTROL METHOD
- 专利标题（中）： 半导体器件生产控制方法
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申请号： US12480355申请日： 2009-06-08
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公开(公告)号： US20090306805A1公开(公告)日： 2009-12-10
- 发明人: Suigen Kyoh
- 申请人： Suigen Kyoh
- 优先权： JP2008-150985 20080609
- 主分类号： G06F17/00
- IPC分类号： G06F17/00 ; H01L21/66
摘要：
A semiconductor device production control method includes monitoring, after a production process of a semiconductor device, a process result at a predetermined position of a pattern to which the process is applied, to obtain a deviation with respect to a predetermined target result, quantitatively obtaining a degree of influence on an operation of a semiconductor device from the deviation of the process result, and comparing the degree of influence that is quantitatively obtained with a predetermined allowable margin for operation specifications of the semiconductor device.
公开/授权文献
- US08285412B2 Semiconductor device production control method 公开/授权日：2012-10-09
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