发明申请
- 专利标题: Radiation System and Lithographic Apparatus Comprising the Same
- 专利标题(中): 包括辐射系统和平版印刷设备
-
申请号: US12465118申请日: 2009-05-13
-
公开(公告)号: US20090309048A1公开(公告)日: 2009-12-17
- 发明人: Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardu Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
- 申请人: Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardu Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G01J3/10
- IPC分类号: G01J3/10 ; G21K5/00
摘要:
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.