发明申请
- 专利标题： Radiation System and Lithographic Apparatus Comprising the Same
- 专利标题（中）： 包括辐射系统和平版印刷设备
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申请号： US12465118申请日： 2009-05-13
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公开(公告)号： US20090309048A1公开(公告)日： 2009-12-17
- 发明人: Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardu Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
- 申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardu Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G01J3/10
- IPC分类号： G01J3/10 ; G21K5/00
摘要：
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.