发明申请
- 专利标题: EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- 专利标题(中): 曝光装置及其制造方法
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申请号: US12482797申请日: 2009-06-11
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公开(公告)号: US20090310109A1公开(公告)日: 2009-12-17
- 发明人: Tadashi Hattori
- 申请人: Tadashi Hattori
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-158550 20080617
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
When a substrate stage is located in a first area, a first measurement device measures the same portion of the substrate at the plural measurement points both before and after the stage is horizontally driven. A controller calculates a first difference of the stage in the vertical direction in the first area accompanying driving of the stage horizontally, based on a first measurement result, calculates a value representing a surface shape of the substrate by subtracting the first difference from the first measurement result, calculates a second difference of the stage in the vertical direction in the second area accompanying driving of the stage horizontally by subtracting the value from a value representing a vertical position of the substrate when the stage is located in the second area, and controls a vertical position of the stage in the second area based on the second difference.
公开/授权文献
- US08120750B2 Exposure apparatus and method of manufacturing device 公开/授权日:2012-02-21
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