发明申请
- 专利标题： MASK BLANK GLASS SUBSTRATE, MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, AND MASK MANUFACTURING METHOD
- 专利标题（中）： 掩模玻璃基板，掩模玻璃基板制造方法，掩模制造方法和掩模制造方法
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申请号： US12486106申请日： 2009-06-17
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公开(公告)号： US20090317729A1公开(公告)日： 2009-12-24
- 发明人: Hisashi Kasahara , Yasushi Okubo
- 申请人： Hisashi Kasahara , Yasushi Okubo
- 申请人地址： JP Tokyo
- 专利权人： HOYA CORPORATION
- 当前专利权人： HOYA CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-158765 20080618
- 主分类号： G03F1/00
- IPC分类号： G03F1/00
摘要：
A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.
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