发明申请
US20090325334A1 GaN BASED GROUP III-V NITRIDE SEMICONDUCTOR LIGHT-EMITTING DIODE AND METHOD FOR FABRICATING THE SAME
失效
GaN基III-V族氮化物半导体发光二极管及其制造方法
- 专利标题: GaN BASED GROUP III-V NITRIDE SEMICONDUCTOR LIGHT-EMITTING DIODE AND METHOD FOR FABRICATING THE SAME
- 专利标题(中): GaN基III-V族氮化物半导体发光二极管及其制造方法
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申请号: US12495000申请日: 2009-06-30
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公开(公告)号: US20090325334A1公开(公告)日: 2009-12-31
- 发明人: Joon-seop Kwak , Kyo-yeol Lee , Jae-hee Cho , Su-hee Chae
- 申请人: Joon-seop Kwak , Kyo-yeol Lee , Jae-hee Cho , Su-hee Chae
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electro-mechanics Co., Ltd.
- 当前专利权人: Samsung Electro-mechanics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR2000-77746 20001218; KR2001-4035 20010129
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
A GaN based III-V nitride semiconductor light-emitting device and a method for fabricating the same are provided. In the GaN based III-V nitride semiconductor light-emitting device including first and second electrodes arranged facing opposite directions or the same direction with a high-resistant substrate therebetween and material layers for light emission or lasing, the second electrode directly contacts a region of the outmost material layer exposed through an etched region of the high-resistant substrate. A thermal conductive layer may be formed on the bottom of the high-resistant substrate to cover the exposed region of the outmost material layer.
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