发明申请
- 专利标题： ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE
- 专利标题（中）： 有机硅膜及其形成方法，用于形成半导体器件绝缘膜的组合物及其制造方法，接线结构和半导体器件
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申请号： US12278224申请日： 2007-01-31
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公开(公告)号： US20100007025A1公开(公告)日： 2010-01-14
- 发明人: Hisashi Nakagawa , Tatsuya Yamanaka , Masahiro Akiyama , Terukazu Kokubo , Youhei Nobe
- 申请人： Hisashi Nakagawa , Tatsuya Yamanaka , Masahiro Akiyama , Terukazu Kokubo , Youhei Nobe
- 申请人地址： JP Chuo-ku, Tokyo
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Chuo-ku, Tokyo
- 优先权： JP2006-025572 20060202; JP2006-254389 20060920
- 国际申请： PCT/JP2007/051631 WO 20070131
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; H01L23/48 ; C08G77/04
摘要：
An insulating-film-forming composition for a semiconductor device comprising an organic silica sol with a carbon atom content of 11 to 17 atom % and an organic solvent is disclosed. The organic silica sol comprises a hydrolysis-condensation product P1 and a hydrolysis-condensation product P2. The hydrolysis-condensation product P1 is obtained by hydrolyzing and condensing (A) a silane monomer comprising a hydrolyzable group and (B) a polycarbosilane comprising a hydrolyzable group in the presence of (C) a basic catalyst, and the hydrolysis-condensation product P2 is obtained by hydrolyzing and condensing (D) a silane monomer comprising a hydrolyzable group.
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