发明申请
US20100007688A1 LIQUID JETTING APPARATUS AND LIQUID JETTING METHOD 有权
液体喷射装置和液体喷射方法

  • 专利标题: LIQUID JETTING APPARATUS AND LIQUID JETTING METHOD
  • 专利标题(中): 液体喷射装置和液体喷射方法
  • 申请号: US12563846
    申请日: 2009-09-21
  • 公开(公告)号: US20100007688A1
    公开(公告)日: 2010-01-14
  • 发明人: Yue GAOKatsuhiro OKUBO
  • 申请人: Yue GAOKatsuhiro OKUBO
  • 申请人地址: JP Tokyo
  • 专利权人: Seiko Epson Corporation
  • 当前专利权人: Seiko Epson Corporation
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2004-076891 20040317; JP2004-085586 20040323
  • 主分类号: B41J2/04
  • IPC分类号: B41J2/04
LIQUID JETTING APPARATUS AND LIQUID JETTING METHOD
摘要:
A liquid jetting apparatus and a liquid jetting method are achieved that can prevent unexpected landing position displacement relating to satellite droplets. For example, the liquid jetting apparatus includes a head in which a nozzle row constituted by a plurality of nozzles lined up in a row is arranged at a medium-opposing surface which is in opposition to a medium, a head movement section that moves the head in a predetermined direction along a surface of the medium, a spacing adjustment section that adjusts a spacing between the head and the medium, and an ejection control section that carries out ejection control of a liquid by determining at least one non-ejection nozzle among a plurality of nozzles sandwiched between a nozzle at one end of the nozzle row and a nozzle at another end thereof, the non-ejection nozzle being a nozzle which is caused not to eject liquid, the number of the non-ejection nozzle being determined according to a spacing from the medium-opposing surface to the surface of the medium.
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