发明申请
US20100015449A1 COMPOSITION FOR FORMING GAS-BARRIER MATERIAL, GAS-BARRIER MATERIAL, A METHOD OF PRODUCING THE SAME, AND GAS-BARRIER PACKING MATERIAL
有权
用于形成气体阻挡材料的组合物，气体阻挡材料，其制造方法和气体包装材料
- 专利标题： COMPOSITION FOR FORMING GAS-BARRIER MATERIAL, GAS-BARRIER MATERIAL, A METHOD OF PRODUCING THE SAME, AND GAS-BARRIER PACKING MATERIAL
- 专利标题（中）： 用于形成气体阻挡材料的组合物，气体阻挡材料，其制造方法和气体包装材料
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申请号： US12518209申请日： 2008-01-09
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公开(公告)号： US20100015449A1公开(公告)日： 2010-01-21
- 发明人: Yusuke Obu , Hiroshi Sasaki , Kashiko Kawai , Hideki Masuda , Hideki Matsuda , Naoki Horike , Takahiro Hidaka , Koichi Tamura
- 申请人： Yusuke Obu , Hiroshi Sasaki , Kashiko Kawai , Hideki Masuda , Hideki Matsuda , Naoki Horike , Takahiro Hidaka , Koichi Tamura
- 申请人地址： JP Tokyo JP Hyogo
- 专利权人： TOYO SEIKAN KAISHA, LTD.,KANSAI PAINT CO., LTD.
- 当前专利权人： TOYO SEIKAN KAISHA, LTD.,KANSAI PAINT CO., LTD.
- 当前专利权人地址： JP Tokyo JP Hyogo
- 优先权： JP2007-003725 20070111; JP2007-126899 20070511
- 国际申请： PCT/JP2008/050120 WO 20080109
- 主分类号： B32B27/38
- IPC分类号： B32B27/38 ; C08G2/00
摘要：
A composition for forming a gas-barrier material, comprising a polycarboxylic acid-type polymer (A) and at least a bifunctional alicyclic epoxy compound (B). The composition for forming a gas-barrier material features excellent gas-barrier property, retort resistance and flexibility, can be cured at a low temperature in a short period of time without affecting the plastic base material, and contributes to improving the productivity.