发明申请
- 专利标题: METHOD FOR FORMING BUMPS IN SUBSTRATES WITH THROUGH VIAS
- 专利标题(中): 用于通过VIAS在基板上形成气泡的方法
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申请号: US12537075申请日: 2009-08-06
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公开(公告)号: US20100032834A1公开(公告)日: 2010-02-11
- 发明人: Gian Pietro Vanalli , Giovanni Campardo , Aldo Losavio , Paolo Pulici , Pier Paolo
- 申请人: Gian Pietro Vanalli , Giovanni Campardo , Aldo Losavio , Paolo Pulici , Pier Paolo
- 申请人地址: IT Agrate Brianza (MI) IT Milian
- 专利权人: STMicroelectronics S.r.l,POLITECNICO DI MILANO
- 当前专利权人: STMicroelectronics S.r.l,POLITECNICO DI MILANO
- 当前专利权人地址: IT Agrate Brianza (MI) IT Milian
- 优先权: ITMI2008A1505 20080808
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L21/768
摘要:
A method for manufacturing solder bumps for through vias in a substrate having a first surface and a second surface opposed to each other. The method includes the steps of forming a blind hole extending in the substrate from the first surface for each via and filling each blind hole with a conductive filler; a deepest part of each filler includes a bump portion made of a solder material. The method further includes the step of removing a part of the substrate extending from the second surface to have at least the bump portions protrude from the substrate. The non-protruding part of each filler defines the corresponding via and the bump portion defines the corresponding bump.
公开/授权文献
- US08759215B2 Method for forming bumps in substrates with through vias 公开/授权日:2014-06-24
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