发明申请
- 专利标题: REMOVABLE OPTICAL MONITORING SYSTEM FOR CHEMICAL MECHANICAL POLISHING
- 专利标题(中): 可拆卸的化学机械抛光光学监测系统
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申请号: US12579245申请日: 2009-10-14
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公开(公告)号: US20100035519A1公开(公告)日: 2010-02-11
- 发明人: Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
- 申请人: Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
- 主分类号: B24B49/12
- IPC分类号: B24B49/12
摘要:
A polishing system includes a platen having a top surface to receive a polishing pad, a recess in the top surface, and a cavity inside the platen spaced from the recess, a carrier head to hold a surface of a substrate against the polishing pad on the platen, a monitoring module located in the cavity, the monitoring module including a light source and a detector, an optical head removably mounted in the recess in the top surface platen, and an optical fiber having a proximate end coupled to the monitoring module and a distal end held by the optical head holding the distal end of the optical fiber in a position to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate.
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