Invention Application
- Patent Title: High frequency surface acoustic wave device and the substrate thereof
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Application No.: US12232033Application Date: 2008-09-10
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Publication No.: US20100038991A1Publication Date: 2010-02-18
- Inventor: Wen-Ching Shih , Hui-Min Wang
- Applicant: Wen-Ching Shih , Hui-Min Wang
- Applicant Address: TW Taipei TW Taipei
- Assignee: Tatung University,Tatung Company
- Current Assignee: Tatung University,Tatung Company
- Current Assignee Address: TW Taipei TW Taipei
- Priority: TW097130638 20080812
- Main IPC: H01L41/04
- IPC: H01L41/04

Abstract:
A high frequency SAW device and the substrate thereof are disclosed. The disclosed high frequency SAW device does not need to use the conventional and expensive sapphire substrate as its substrate. Besides, the disclosed substrate for a high-frequency SAW device can replace the conventional sapphire substrate in the use of the substrate for a high frequency SAW device. The disclosed high frequency SAW device comprises: a substrate; a first buffering layer forming on the surface of the substrate; a second buffering layer forming on the surface of the first buffering layer; a piezoelectric layer forming on the surface of the second buffering layer; an input transformation unit; and an output transformation unit, wherein the input transformation unit and the output transformation unit are formed in pairs on the surface of or beneath the piezoelectric layer.
Public/Granted literature
- US07741752B2 High frequency surface acoustic wave device and the substrate thereof Public/Granted day:2010-06-22
Information query
IPC分类: