The present invention allows abrasion resistance in silica-based films containing an organic material to be improved. Such a silica-based film contains silica as an inorganic oxide to be its main component, and a poorly water-soluble polymer as an organic material. Example of the poorly water-soluble polymer include a polymer having a solubility of 1.0 g or less with respect to 100 g of water at 25° C., such as polycaprolactone polyol, bisphenol A polyol and glycerol polyol. The silica-based film exhibits good abrasion resistance not only in the Taber abrasion test, but also in the steel wool abrasion test.